Area-Specific Positioning of Metallic Glass Nanowires on Si Substrate

Abstract This paper presents a novel technique to fabricate metallic nanowires in selective areas on Si substrate. Thermoplastic drawing of viscous glass from cavities etched can produce nanowires. The length and diameter be controlled by adjusting the conditions without changing mold. A thin metal shadow mask is stacked above mold during thermoplastic only specific locations. restricts flow predefined shapes mask, resulting formation selected Si. An Al foil-based made benchtop vinyl cutter used demonstrate proof-of-concept. Even simple foil enables positioning as small 200 µm precision limits smallest dimensions patterned areas, which further improved using laser-fabricated stencil masks. Results show that single row drawing. Controllable substrates enable new applications characterization techniques for nanostructures.